micro resist technology
Specialty Photoresists
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ma-N 2400

Part of the Micro Resist Technology Line
Specialty Photoresists

Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices.

  • Aqueous alkaline development
  • High resolution capability (~ 40 – 50 nm)
  • High wet and dry etch resistance
  • Easy to remove

Data sheet:

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FEATURED APPLICATIONS

Product Applications

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.