Specialty Photoresists
mr-DWL
Part of the Micro Resist Technology LineNegative resists for direct laser writing @ 405 nm
- Sensitive above 400 nm, for direct writing laser @ 405 nm
- High thermal and chemical stability
- High wet and dry etch stability
Data sheet:
Ancillaries:
- MRT Removers
- Remover PG
- mr-Dev 600
Application:
- Direct Writing Lithography