micro resist technology
Specialty Photoresists
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mr-DWL

Part of the Micro Resist Technology Line
Specialty Photoresists

Negative resists for direct laser writing @ 405 nm

  • Sensitive above 400 nm, for direct writing laser @ 405 nm
  • High thermal and chemical stability
  • High wet and dry etch stability

Data sheet:

Ancillaries:

Application:

  • Direct Writing Lithography

FEATURED APPLICATIONS

Product Applications

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.