micro resist technology
Specialty Photoresists
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Part of the Micro Resist Technology Line
Specialty Photoresists

NIL resist with excellent curing and nanoimprint performance in combination with PDMS soft stamp materials.

  • Increased dry etching resistance in demanding plasma processes
  • Excellent reproducibility enabling high volume production
  • Film thickness adjustable from sub 100 nm range up to several microns

Data sheet:


  • UV-based NIL
  • Pattern Transfer