micro resist technology
Specialty Photoresists
Specialty Photoresists
mr-NIL210
Part of the Micro Resist Technology Line
NIL resist with excellent curing and nanoimprint performance in combination with PDMS soft stamp materials.
- Increased dry etching resistance in demanding plasma processes
- Excellent reproducibility enabling high volume production
- Film thickness adjustable from sub 100 nm range up to several microns
Data sheet:
Applications:
- UV-based NIL
- Pattern Transfer
FEATURED APPLICATIONS