micro resist technology
Specialty Photoresists
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SIPOL

Part of the Micro Resist Technology Line
Specialty Photoresists

Silicon-containing thermal nanoimprint resist for the fabrication of high aspect ratio patterns

  • Excellent flowability
  • Superior demolding characteristics
  • Imprints can be performed at moderate temperatures in the range of 110 – 140°C.

Data sheet:

Applications:

  • Thermal NIL
  • Pattern Transfer