Multipurpose resist that can be utilized for gate, phase shift mask contact holes, and trench applications in the 180-130 nm CD range
- Compatible with a wide range of substrates including silicon and both organic and inorganic anti-reflective materials
- 150°C thermal stability
- CD-26 Developer
- Remover 1165
- EBR-10A Edge Bead Remover
- General Lithography: Positive DUV Resists
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