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Overview

Thick positive photoresist designed for the requirements of grayscale lithography

  • Film thickness from 1 µm up to 60 µm and higher
  • High intensity laser exposure possible without out-gassing
  • 50-60 µm depth range of patterns

Applications

  • Grayscale Lithography

Recommended ancillaries

Remover PG

To strip PMGI, LOR, PMMA, KMPR® 1000 & minimally cross-linked SU-8 resists
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MRT Developers

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MF-26A Developer

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MRT Removers

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