Positive and negative-tone photoresists engineered for temporary plating applications. Designed to withstand aggressive plating bath chemistry while delivering clean, residue-free removal after processing.
Available in both Positive and Negative tone variants to support a range of feature geometries and electroplating process requirements.
Browse Kayaku’s temporary plating resists for high-aspect-ratio electroplating molds. Engineered for advanced packaging, MEMS, and bump formation processes.
Ideal for
Ancillaries
