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Overview

Negative resists for direct laser writing at 405 nm

  • Sensitive above 400 nm, for direct writing laser at 405 nm
  • High thermal and chemical stability
  • High wet and dry etch stability

Applications

  • Direct Writing Lithography

Recommended ancillaries

Remover PG

To strip PMGI, LOR, PMMA, KMPR® 1000 & minimally cross-linked SU-8 resists
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MRT Removers

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mr-Dev 600

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