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Overview

Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass.

  • Mask for pattern transfer processes (dry and wet etching)
  • No adhesion promoter or primer necessary
  • Very low release forces
  • No oxygen inhibition

Applications

  • UV-based
  • NIL Pattern transfer

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