SU-8 3000CF Dry Film Resist
Part of the Nippon Kayaku Line
SU-8 3000CF Dry Film Resist (DFR) is a negative type permanent film photoresist that can produce rectangular shapes with a high aspect ratio through the photolithography process. It has a structure in which the resist layer is laminated with a cover film and a support film. This eliminates the solvent removal processes and contributes to process simplification. SU-8 3000CF DRF is suitable for forming hollow structures (cavity structures) and is widely used in electronic device applications.
KEY FEATURES
Ultra-thick, high aspect ratio fabrication
Ultra-thick film can be easily formed by multiple lamination
Pre-bake time can be significantly reduced
Cavity formation
Very thin polymer cavity structure can be easily obtained by laminating DFR on to the wall structure.
Via-filling & conformal coating
By using a vacuum laminator, DFR is suitable either for void-free via-filling or conformal coating.
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APPLICATION NOTES
- SAW/BAW RF Filters
- Actuator
- Lid material for microchannels
- Microfluidics