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Overview

An advanced resist for 130 nm design rules.

Key features

  • Low iso-dense bias
  • Maximum isolated film retention to <110 nm
  • Compatible with PSM & OPC assist features to enlarge process windows

Applications

  • 130 nm device node

Recommended ancillaries

Remover 1165

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AR 3 BARC

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Note

Kayaku Advanced Materials, Inc.’s distribution of Qnity Electronic Materials semiconductor and advanced packaging electronic materials is supported by our value-added services founded on chemical and formulary knowledge, extensive applications experience, and process engineering expertise. Kayaku Advanced Materials only represents Qnity in North America.

Find additional Qnity materials for your applications.

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