UV6 Positive DUV Photoresist has been optimized to provide vertical profile imaging of dense and semi-isolated features for device production design rules to 180 nm.
This resist is ideally suited for use with AR2™ Antireflectant and a variety of inorganic substrates. Minimal sensitivity to PEB temperature variation (<5 nm/°C), superior etch resistance, wide process window, and low bias properties provides high yielding device fabrication. UV6 is most compatible with 0.26N developers (2.38% TMAH).
Kayaku Advanced Materials, Inc.’s distribution of Qnity Electronic Materials semiconductor and advanced packaging electronic materials is supported by our value-added services founded on chemical and formulary knowledge, extensive applications experience, and process engineering expertise. Kayaku Advanced Materials only represents Qnity in North America.
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