MicroChem Negative Epoxy Resists

MicroChem epoxy resists consist of chemically amplified, epoxy-based negative resists that are highly functional, and photo-imageable to near UV (365nm) radiation. Cured films or microstructures are very resistant to solvents, acids and bases and have excellent thermal and mechanical stability, making them well suited for fabricating permanent structures such as pixel walls, fluidic channels and nozzles, micro arrays and spacers.

Epoxy ResistsFeaturesUV
Sensitivity
Film Thickness
(optimum)
Resolution

KMPR® 1000
  • Temporary or permanent applications
  • TMAH (0.26N) development
  • Electroplating and etch mask
i-line4-75 µm>5:1 Aspect Ratio