micro resist technology
Specialty Photoresists
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ma-P 1200

Part of the Micro Resist Technology Line
Specialty Photoresists

Photoresist series designed for the use in microelectronics and microsystems technology

  • Variety of viscosities for 0.3 – 40 μm film thickness in one spin-coating step
  • Broadband, g-, h- and i-Line exposure
  • Very good pattern stability in wet etch processes & acid & alkaline plating baths
  • Highly stable in dry etch processes, e.g. CHF3, CF4, SF6

Data sheet:

Ancillaries:

Applications:

  • Dry etch
  • Mould for electroplating
  • Wet etch
  • Fabrication of micro lenses through pattern transfer of reflowed resist
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Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.