SU-8 2000

SU-8 2000 is a high contrast, epoxy based photoresist designed for micro-machining and other microelectronic applications, where a thick, chemically and thermally stable image is desired. SU-8 2000 is an improved formulation of SU-8, which has been widely used by MEMS producers for many years. The use of a faster drying, more polar solvent system results in improved coating quality and increases process throughput. SU-8 2000 is available in twelve standard viscosities. Film thicknesses of 0.5 to >200 microns can be achieved with a single coat process. The exposed and subsequently thermally cross linked portions of the film are rendered insoluble to liquid developers. SU-8 2000 has excellent imaging characteristics and is capable of producing very high aspect ratio structures. SU-8 2000 has very high optical transmission above 360 nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films. SU-8 2000 is best suited for permanent applications where it is imaged, cured and left on the device.

Material attributes:

  • Spin coat films from <1µm to >75µm
  • High thermal and chemical resistance
  • Optically transparent
  • Compatible with i-Line imaging equipment

Material uses:

  • Fabrication of PDMS molds
  • Structural components such as micro arrays, fluidic channels, display pixel walls and dielectric layers
  • Dry etch masks
  • Rapid prototyping
25 µm wide, 125 µm high
Source: Kayaku Advanced Materials, Inc.
10µm features, 50µm SU-8 2000 coating
Source: micro resist technology
Cantilever
Source: Genoletet, al., IBM-Zurich, Rev. Sci., Instrum., 70, 2398 (1999)
Microfluidic Actuator
Source: N Chronis, LP Lee, UC Berkeley, μTAS 2002, 754 (2002)