micro resist technology
Specialty Photoresists
Home 5 Product 5 mr-EBL 6000

mr-EBL 6000

Part of the Micro Resist Technology Line
Specialty Photoresists

Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices.

  • Aqueous alkaline development
  • High resolution capability (~ 40 – 50 nm)
  • High wet and dry etch resistance
  • Easy to remove

Data sheet:

Ancillaries:

Applications: