Specialty Photoresists
mr-EBL 6000
Part of the Micro Resist Technology LineNegative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices.
- Aqueous alkaline development
- High resolution capability (~ 40 – 50 nm)
- High wet and dry etch resistance
- Easy to remove
Data sheet:
Ancillaries:
- Remover PG
- MRT Developers
- MRT Removers
- ma-D 525
Applications:
- E-beam Lithography
- Negative DUV/e-beam