mr-XNIL26SF

NIL resist with a high level of fluorinated components yielding excellent stamp release properties and minimal defects.

  • Very low release forces
  • Excellent wetting properties
  • Fast curing, high resolution

Data sheet:

Ancillaries

  • mr-APS1 Adhesion Promoter
  • ma-T 1050 Thinner

Applications:

  • UV-based NIL
  • Pattern Transfer
  • Micro/nano high aspect ratio patterning