micro resist technology
Specialty Photoresists
Specialty Photoresists
mr-XNIL26SF
Part of the Micro Resist Technology Line
NIL resist with a high level of fluorinated components yielding excellent stamp release properties and minimal defects.
- Very low release forces
- Excellent wetting properties
- Fast curing, high resolution
Data sheet:
Ancillaries
- mr-APS1 Adhesion Promoter
- ma-T 1050 Thinner
Applications:
- UV-based NIL
- Pattern Transfer
- Micro/nano high aspect ratio patterning
FEATURED APPLICATIONS