Electronic Materials
UV™ 135 Positive DUV Photoresist
Part of the Dupont Line
An advanced resist for 130 nm design rules:
- Low iso-dense bias
- Maximum isolated film retention to <110 nm
- Compatible with PSM & OPC assist features to enlarge process windows
Ancillaries:
- AR 3 BARC
- CD-26 Developer
- MF-26 Developer
- Remover 1165
Applications:
- 130 nm device node
Kayaku Advanced Materials, Inc.’s distribution of DuPont Electronic Materials semiconductor and advanced packaging electronic materials is supported by our value-added services founded on chemical and formulary knowledge, extensive applications experience, and process engineering expertise.
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