Kayaku Advanced Materials, Inc. offers a broad line of ancillary products for resist thinning, edge bead removal, development, rinse and removal of photoresists. These products work effectively with our PMGI, LOR, PMMA & copolymer, and SU-8 resists, as well as with many other commercially available photoresist products. Competitively priced, these ancillary products are available in a wide range of package sizes.

Adhesion Promoter/Release Layer

Product NameProduct Function
OmniCoatAdhesion Promoter

Photoresist Thinners

Product NameProduct Function
A thinnerTo dilute PMMA A resists
C thinnerTo dilute PMMA C resists
EL thinnerTo dilute copolymer resists
G thinnerTo dilute LOR and PMGI SFG resists
SU-8 2000 thinnerTo dilute SU-8 2000 resists
T thinnerTo dilute PMGI SF resists

Edge Bead Remover

Product NameProduct Function
EBR PGEdge bead removal, equipment cleanup


Product NameProduct Function
MIBK:IPA 1:1High speed PMMA & copolymer resist development
MIBK:IPA 1:2PMMA & copolymer resist development
MIBK:IPA 1:3High resolution PMMA & copolymer resist development
MicroChem 303 A DeveloperHolographic lithography and general microelectronics
MicroChem 452 DeveloperDevelopment of DuPont® S1800® and other commercially available photoresists
MicroChem 455 DeveloperDevelopment of DuPont® S1800® and other commercially available photoresists
PMGI 101 developerPMGI resist development
SU-8 developerSU-8 & SU-8 2000 resist development


Product NameProduct Function
MicroChem Remover 1112ATo strip DNQ/Novolak-based resists
Remover PGTo strip SU-8, PMGI, LOR & PMMA resists

Kayaku Advanced Materials, Inc.