Positive DUV photoresist developed for deep implant applications
- Low viscosity allows for reduced dispense volume
- Improved coating uniformity for films ranging from 1.1 µm to 3.0 µm
- 150°C thermal stability
- CD-26 Developer
- Remover 1165
- EBR-10A Edge Bead Remover
- General Lithography: Positive DUV Resists
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