Navigation

Overview

General purpose, high-throughput, i-Line photoresist for 0.35 µm front-end and back-end applications

Key features

  • Dense lines/spaces and isolated lines on polysilicon, and in high-aspect ratio films on TiN
  • Contact holes on oxide
  • Fast photo speed

Recommended ancillaries

Remover PG

To strip PMGI, LOR, PMMA, KMPR® 1000 & minimally cross-linked SU-8 resists
Add to Quote

Remover 1112A

Add to Quote

Remover 1165

Add to Quote

MF-26A Developer

Add to Quote

CD-26 Developer

Add to Quote

EBR-10A Edge Bead Remover

Add to Quote

Note

Kayaku Advanced Materials, Inc.’s distribution of Qnity Electronic Materials semiconductor and advanced packaging electronic materials is supported by our value-added services founded on chemical and formulary knowledge, extensive applications experience, and process engineering expertise. Kayaku Advanced Materials only represents Qnity in North America.

Find additional Qnity materials for your applications.