MEGAPOSIT™ SPR™955-CM Series High Resolution i-Line Photoresists

General purpose, high-throughput, i-Line photoresist for 0.35 µm front-end and back-end applications

  • Dense lines/spaces and isolated lines on polysilicon, and in high-aspect ratio films on TiN
  • Contact holes on oxide
  • Fast photo speed

Ancillaries:

Applications:

  • High Resolution i-Line
  • Bi-layer Lift-off

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