Specialty Photoresists
mr-NIL200
Part of the Micro Resist Technology LineLow viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass.
Very low release forces
No adhesion promoter or primer necessary
No oxygen inhibition
Mask for pattern transfer processes (dry and wet etching)
Data Sheet
Applications:
- UV-based
- NIL Pattern transfer