Specialty Photoresists
ma-P 1200G
Part of the Micro Resist Technology LineThick positive photoresist designed for the requirements of grayscale lithography
- Film thickness from 1 µm up to 60 µm and higher
- High intensity laser exposure possible without out-gassing
- 50-60 µm depth range of patterns
Data sheet:
Ancillaries:
- MRT Developers
- Remover PG
- MF-26A Developer
- MRT Removers
Application:
- Grayscale