ma-P 1200G

Thick positive photoresist designed for the requirements of grayscale lithography

  • Film thickness from 1 µm up to 60 µm and higher
  • High intensity laser exposure possible without out-gassing
  • 50-60 µm depth range of patterns

Data sheet:

Ancillaries:

  • MRT Developers
  • Remover PG
  • MF-26A Developer
  • MRT Removers

Application:

  • Grayscale