micro resist technology
Specialty Photoresists
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mr-UVCur26SF

Part of the Micro Resist Technology Line
Specialty Photoresists

NIL resist applicable by inkjet printing and with high curing speeds suitable for roll-to-roll NIL processes.

  • Solvent-free, low viscosity
  • Excellent imprint characteristics
  • Compatibility to various mold materials (Ni, Si, OrmoStamp®)
  • Good adhesion to PC and PET substrates
  • Excellent dry-etch resistance for pattern transfer

Data sheet:

Applications:

  • UV-based NIL
  • Pattern Transfer
  • Permanent Applications