UVN® 30 Negative DUV Photoresist

Targeted for fast throughput device production rules down to 150 nm.

  • 10.0 -20.0 mJ/cm2 for lines/spaces
  • Varied depth of focus
  • 175oC thermal stability

Ancillaries:

Applications:

  • 150 -180 nm nodes high etch resistance

Kayaku Advanced Materials, Inc.’s distribution of DuPont Electronic Materials semiconductor and advanced packaging electronic materials is supported by our value-added services founded on chemical and formulary knowledge, extensive applications experience, and process engineering expertise.

Find additional DuPont materials for your applications.

DuPont