Electronic Materials
UVN® 30 Negative DUV Photoresist
Part of the Dupont LineTargeted for fast throughput device production rules down to 150 nm.
- 10.0 -20.0 mJ/cm2 for lines/spaces
- Varied depth of focus
- 175oC thermal stability
Ancillaries:
- CD-26 Developer
- MF-26 Developer
- Remover 1165
Applications:
- 150 -180 nm nodes high etch resistance
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