DuPont
Electronic Materials
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UVN® 30 Negative DUV Photoresist

Part of the Dupont Line
Electronic Materials

Targeted for fast throughput device production rules down to 150 nm.

  • 10.0 -20.0 mJ/cm2 for lines/spaces
  • Varied depth of focus
  • 175oC thermal stability

Ancillaries:

Applications:

  • 150 -180 nm nodes high etch resistance

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