Specialty Photoresists
ma-P 1275HV
Part of the Micro Resist Technology LineThick photoresists designed for electroplating structures in microsystems technology
- Up to 60 µm film thickness
- High stability in acid and alkaline plating baths
- High dry and wet etch resistance
- Side wall angle up to 87° with mask aligner broadband exposure
Data sheet:
Ancillaries:
- MF-26A Developer
- MRT Developers
- Remover 1165
- EBR-10A Edge Bead Remover
- MRT Removers
Applications:
- Plating: Thick positive resists
- Microlenses