Kayaku Advanced Materials, Inc. Negative Epoxy Resists

Kayaku Advanced Materials, Inc. epoxy resists consist of chemically amplified, epoxy-based negative resists that are highly functional, and photo-imageable to near UV (365nm) radiation. Cured films or microstructures are very resistant to solvents, acids and bases and have excellent thermal and mechanical stability, making them well suited for fabricating permanent structures such as pixel walls, fluidic channels and nozzles, micro arrays and spacers.

Epoxy ResistsFeaturesUV
Sensitivity
Film Thickness
(optimum)
Resolution

SU-8
  • Wide range of viscosities
  • High aspect ratio patterning
  • Photo-definable ultra-thick structures
i-line10-200 µm>10:1 Aspect Ratio

SU-8 2000
  • Improved substrate wetting
  • Faster drying
  • Higher process throughput

i-line 10-100 µm>10:1 Aspect Ratio

SU-8 3000
  • Improved substrate adhesion
  • Reduced coating stress

i-line10-70 µm>5:1 Aspect Ratio

SU-8 TF 6000
  • High resolution thin film processing
  • Highly uniform thin films
  • Improved substrate adhesion

g-, h-, i-line0.5-10 µmHigh resolution