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Photoresists & Specialty Chemicals
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E-Beam Lithography

Part of the Applications Notes Line
Photoresists & Specialty Chemicals

PMMA Positive Resists: Benefits/Attributes

  • Positive tone
  • e-beam and x-ray imageable
  • Wide range of film thicknesses
  • Resist developers and strippers
  • Excellent adhesion to most substrates

ma-N 2400 Negative Resist: Benefits/Attributes

  • e-beam and DUV-sensitive
  • Suitable as etch mask exhibiting high dry and wet etch resistance
  • Good thermal stability
  • High resolution capability
  • Aqueous alkaline development

Resist thickness: 180 nm Lines and spaces: 80 nm

Resist thickness: 800 nm Lines and spaces: 250 nm