SU‑8 is a high‑performance, epoxy‑based photoresist engineered for advanced micromachining and microelectronic fabrication. Designed for applications requiring thick, chemically robust, and thermally stable structures, SU‑8 delivers exceptional image quality and durability.
During exposure, the photoresist undergoes cross‑linking, creating highly stable regions that become insoluble in standard liquid developers, ensuring precise pattern retention. With its excellent optical transparency above 360 nm, SU‑8 enables the formation of near‑vertical sidewalls even in very thick film layers, making it ideal for high‑aspect‑ratio microstructures.
Because of its long‑term stability and strong material properties, SU‑8 is best suited for permanent microfabrication applications where the patterned resist remains in place after imaging and curing.
