Nanoimprint Lithography Resists

  • Thermoplastic and photo-curable materials for thermal and photo-NIL

mr-I PMMA

Thermoplastic polymer for basic nanoimprint lithography investigations

mr-I T85

Thermoplastic polymer especially suited for lab-on-chip applications

mr-NIL 6000E

UV curable material for isothermal imprint processing with outstanding pattern stability

mr-NIL200

Next generation UV-NIL resist for industrial manufacturing of micro and nano patterns

mr-NIL210

UV curable imprint resist with excellent compatibility to soft PDMS stamps

mr-NIL212FC

UV-curable resist with outstanding dry etch characteristics, fast curing properties and an excellent nanoimprint performance

mr-XNIL26SF

Solvent Free Photo-Curable Nanoimprint Resist

mr-UVCur26SF

UV curable resist formulation applicable by inkjet and suitable for R2R processes

SIPOL

Si-containing thermoplastic polymer for high-aspect ratio patterning