Nanoimprint Lithography Resists

Thermoplastic and photo-curable materials for thermal and photo-NIL

mr-I PMMA

Thermoplastic polymer for basic nanoimprint lithography investigations

mr-I T85

Thermoplastic polymer especially suited for Lab on chip applications

mr-NIL 6000E

UV curable material for isothermal imprint processing with outstanding pattern stability

mr-NIL200

Next Generation UV-NIL Resist for Industrial Manufacturing of Micro and Nano Patterns

mr-NIL210

UV curable imprint resist with excellent compatibility to soft PDMS stamps

mr-XNIL26SF

Solvent Free Photo-Curable Nanoimprint Resist

mr-UVCur26SF

UV curable resist formulation applicable by inkjet and suitable for R2R processes

SIPOL

Si-containing thermoplastic polymer for high-aspect ratio patterning