Negative Photoresists

  • Negative resists for conventional pattern transfer and lift-off
  • Tunable sidewall profile from vertical to undercut
  • Broadband and i-line sensitivity
  • Aqueous alkaline development

mr-DWL

Negative Resist Series for Direct Laser Writing

ma-N 400/ma-N 1400

Conventional pattern transfer and single layer lift-off for microelectronics and micro systems technology

ma-N 2400

Deep UV & e-beam resists
50 nm resolution with e-beam
High plasma etch stability