For the fabrication of polymer waveguides
Negative Photoresists
- Negative resists for conventional pattern transfer and lift-off
- Tunable sidewall profile from vertical to undercut
- Broadband and i-line sensitivity
- Aqueous alkaline development
mr-DWL
Negative Resist Series for Direct Laser Writing
ma-N 400/ma-N 1400
Conventional pattern transfer and single layer lift-off for microelectronics and micro systems technology
ma-N 2400
Deep UV & e-beam resists
50 nm resolution with e-beam
High plasma etch stability