For standard UV lithography
Positive Photoresists
- Broad range of viscosity to achieve 0.3 to 60 μm film thickness in one spin-coating step
- Designed for UV lithography: mask aligner, greyscale lithography, laser interference
- Aqueous alkaline development
- High chemical and plasma etch stability
ma-P 1200G
Positive resist for greyscale lithography
ma-P 1200LIL
For laser interference lithography
ma-P 1275HV
For standard UV lithography