micro resist technology
Specialty Photoresists
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mr-NIL200

Part of the Micro Resist Technology Line
Specialty Photoresists

Low viscosity, solvent-free photo-curable NIL resist specifically designed for use with rigid and gas-impermeable working stamps like COC, COP, OrmoStamp®, or glass.
Very low release forces
No adhesion promoter or primer necessary
No oxygen inhibition
Mask for pattern transfer processes (dry and wet etching)

Data Sheet

Applications:

  • UV-based
  • NIL Pattern transfer
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Product Applications

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.

Nanoimprint Lithography

At Kayaku Advanced Materials, we offer a wide variety of product lines designed to cater to your unique needs.