(LG-10-01) UV-LIGA microfabrication of 220 GHz sheet beam amplifier gratings with SU-8 photoresists
Joye, Colin D.; Calame, Jeffrey P.; Garven, Morag; Levush, Baruch
Journal of Micromechanics and Microengineering, Volume 20, Issue 12, pp. 125016 (2010).

(LG-10-02) UV Lithography and Molding Fabrication of Ultrathick Micrometallic Structures Using a KMPR Photoresist
Young-Min Shin Gamzina, D. Barnett, L.R. Yaghmaie, F. Baig, A. Luhmann, N.C.
Dept. of Appl. Sci., Univ. of CA, Davis, CA, USA
Microelectromechanical Systems, Journal of June, 2010

(LG-09-01) Research on fabrication of microstructure by using UV-LIGA
Zheng, Xiaohu, Mechanical Department of Huaiyin Institute, Huaian 223001, China
International Technology and Innovation Conference, 2006. ITIC 2006
6-7 Nov. 2006 1194 – 1197, Hangzhou, China ISSN: 0537-9989 19 Jan. 2009

(LG-07-01) SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
A del Campo and C Greiner
Max-Planck-Institut fur Metallforschung, Heisenbergstraße 3, 70569 Stuttgart, Germany
J. Micromech. Microeng. 17 R81–R95, 2007

(LG-07-02) SU-8 as a structural material for labs-on-chips and microelectromechanical systems
Patrick Abgrall1 Veronique Conedera2 Henri Camon2 Anne-Marie Gue2 Nam-Trung Nguyen1
1Singapore-MIT Alliance, Nanyang Technological University, Singapore
2LAAS-CNRS, University of Toulouse, Toulouse, France
Electrophoresis, 28, 4539–4551, 2007

(LG-06-01) SU-8: promising resist for advanced direct LIGA applications for high aspect ratio mechanical microparts
J. Kouba, R. Engelke, et. al.
Microsystem Technologies – HARMST, High Aspect Ratio Micro Structure Technology Workshop, Gyenogju, Korea, 10-13 June 2005 (This is the first of two issues)
Volume 13, Issue 3, December, 2006

(LG-05-01) Manufacturing tolerances for UV LIGA using SU-8 resist
Ronald A Lawes
J. Micromech. Microeng. 15, 2198–2203, 2005

(LG-05-02) UV-LIGA interferometer biosensor based on the SU-8 optical waveguide
B.Y. Shewa, , C.H. Kuob, Y.C. Huangb and Y.H. Tsaia
aDevice Tech. Group, National Synchrotron Radiation Research Ctr., Hsinchu 30077, Taiwan
bDept. of Mechanical Engineering, National Chiao-Tung University, Hsinchu 30077, Taiwan
Sensors and Actuators A: Physical, Volume 120, Issue 2, 17 May, Pages 383-389, (2005)

(LG-04-01) Applications of LIGA technology to precision manufacturing of high-aspect-ratio micro-components and -systems: a review
Chantal Khan Malekaa,*, Volker Sailebb
a. Laboratoire de Physique et Métrologie des Oscillateurs (LPMO)-CNRS 32 Av. de l’Observatoire, Besanc¸on 25044, France
b. Institut für Mikrostrukturtechnik (IMT), Universitaü t Karlsruhe and Forschungszentrum Karlsruhe GmbH, and ANKA,
Angstroümquelle Karlsruhe GmbH, P.O. Box 3640, D-76021 Karlsruhe, Germany
Microelectronics Journal 35 131–143, 2004

(LG-04-02) Low-stressed high-aspect-ratio ultrathick SU-8 UV-LIGA process for the fabrication of a micro heat exchanger
MEMS/MOEMS Components and Their Applications, Siegfried W. Janson; Albert K. Henning, Editors, pp.147-154
SPIE Vol. 5344, 24 January 2004

(LG-03-01) SU-8 based deep x-ray lithography/LIGA
Linke Jian et al.
Proc. SPIE 4979 394 (2003)