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SU-8 TF 6000

Part of the StructSure® Line
Photoresists & Specialty Chemicals

SU-8 TF 6000 Photoresists: High-Resolution Epoxy Resist for Thin Permanent Structures

SU-8 TF 6000 is a high-contrast, chemically amplified, negative tone epoxy-based resist that is sensitive to broadband UV radiations (i-, h- and g-Line) and is recommended wherever high resolution, photoimageable, thin, permanent structures are required. SU-8 TF 6000 is available in five standard viscosities to achieve low defect coatings with film thicknesses ranging from ~ 0.4 to 16 µm in a single coat process.

Material attributes:

  • Photo-imageable thin films with high resolution i-line patterning capability
  • Broadband, i-line, g-line and h-line sensitivity
  • Low temperature cure (< 150°C)
  • Highly uniform thin films

Material uses:

  • High resolution imaging of thin permanent structures
  • MEMS
  • Display pixel walls and dielectric layers

Contact aligner exposure
1 µm L/S – 0.5 µm thick SU-8 TF 6000
Source: Kayaku Advanced Materials, Inc.

I-line stepper exposure
1 µm trenches – 0.5 µm thick SU-8 TF 6000
Source: Kayaku Advanced Materials, Inc.